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US 8,541,157 B2Granted
Resist composition, method of forming resist pattern, compound and acid generator including the same
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsAkiya Kawaue, Yoshiyuki Utsumi, Sho Abe
Life of this patent
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Abstract
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.
Claims12
A resist composition comprising:
- a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid;
- and
- an acid-generator component (B) which generates acid upon exposure,
- wherein said acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety, and
- wherein said base dissociable group is a group represented by general formula (I) shown below:
- wherein R53 represents a fluorinated alkyl group;
- R54 represents a hydrogen atom, an alkyl group or a fluorinated alkyl group;
- f represents 0 or 1;
- and h represents 1 or 2.
6 more elements
A compound represented by general formula (b1-11) shown below:
- wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom in the formula, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent;
- and X− represents an anion:
- wherein R53 represents a fluorinated alkyl group;
- R54 represents a hydrogen atom, an alkyl group or a fluorinated alkyl group;
- f represents 0 or 1;
- and h represents 1 or 2.
3 more elements
Dependencies are inferred from the claim text.