Polishing composition
AssigneeNitta Haas Incorporated
InventorsTakayuki Matsushita, Masashi Teramoto, Haruki Nojo
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Abstract
A polishing composition that can improve polishing property without foaming is provided. A polishing composition includes a pH regulator, a water-soluble polymer compound, and a compound containing an alkylene diamine structure having two nitrogens represented by the following general formula (1), and having at least one block type polyether bonded to the two nitrogens of the alkylene structure, the block type polyether having a bond of an oxyethylene group and an oxypropylene group: where R represents an alkylene group represented by CnH2n, in which n is an integer of 1 or more.
Claims25
A polishing composition, consisting essentially of:
- a pH regulator, a water-soluble polymer compound, and a compound containing an alkylene diamine structure having two nitrogens represented by the following general formula (1), and having at least one block type polyether bonded to at least one of the two nitrogens of the alkylene structure, the block type polyether having a bond of an oxyethylene group and an oxypropylene group,
- a content of the compound being within a range of from 0.0001 to 1% by weight based on a total weight of the polishing composition,
- where R represents an alkylene group represented by CnH2n, in which n is an integer of 1 or more.
Dependencies are inferred from the claim text.