Method of making high temperature resistant models or tools
AssigneeHuntsman Advanced Materials Americas LLC
InventorMatthew Cleaver
Life of this patent
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Abstract
A method of making High Temperature Resistant Models and Tools is provided. An assembly of substrates can be formed with intermediate adhesive layer of curable paste and same curable paste can be used as topcoat or sealer. The curable paste can be machine dispensed from a mixer mixing 2 components composition. The composition can contain a resin, a filler, a chemical thixotropy agent, a latent hardener and another hardener. The method provides easy and cost-effective manufacture of models or tools.
Claims5
A method of producing a model or tool comprising the sequential steps of:
- (a) mixing a first component containing a curable epoxy resin and a thixotropic agent with a second component containing a hardener system comprising at least one polyethyleneimine, at least one other amine having at least two amino hydrogen groups and a complex of a Lewis acid and a Lewis base having latent reactivity in a mix block to form a curable paste wherein the curable paste has a density of between 1.1-1.6 g/cm3;
- (b) machine dispensing the curable paste on an outer surface of a substructure in the form of a continuous layer;
- (c) curing the continuous layer of curable paste at room temperature;
- (d) post-curing the layer of paste at a temperature of at least 50° C.;
- and
- (e) machining the cured continuous layer to produce the model or tool
- wherein the thixotropic agent comprises hydrophilic fumed silica, the Lewis acid is BX3 AlX3, FeX3, FeX2, ZnX2, TiX3 or TiX4 where X independently represents a C1-6 alkyl group, C1-6 alkoxy group, hydrogen, bromine, iodine or fluorine atom provided that when the Lewis acid is BX3 no X represents a fluorine atom, the Lewis base is ammonia or a compound of the formula Z(Ra)3 in which Z is nitrogen or phosphorus and each Ra independently represents a hydrogen atom;
- an alkyl group having from 1 to 20 carbon atoms optionally substituted by one or more phenyl groups in which each phenyl group may be optionally substituted by one or more C1-12 alkyl groups and/or halogen atoms;
- a phenyl group optionally substituted by one or more C1-12 alkyl groups and/or halogen atoms;
- a C5-7 cycloalkyl group;
- or two Ra's together represent an alkylene group having from 4 to 6 carbon atoms one or more of which may be replaced by an oxygen or a sulphur atom and the curable paste after curing has a heat deflection temperature above 100° C.
A curable seamless modelling paste comprising:
- (a) an epoxy resin;
- (b) a thixotropic agent comprising hydrophilic fumed silica;
- and
- (c) a hardener system containing at least one polyethyleneimine compound, at least one other amine having at least two amino hydrogen groups to effect curing at room temperature, and a complex of a Lewis acid and a Lewis base having latent reactivity to effect curing at a temperature of at least 50° C. wherein the Lewis acid is BX3, AlX3, FeX3, FeX2, ZnX2, TiX3 or TiX4 where X independently represents a C1-6 alkyl group, C1-6 alkoxy group, hydrogen, bromine, iodine or fluorine atom provided that when the Lewis acid is BX3 no X represents a fluorine atom and the Lewis base is ammonia or a compound of the formula Z(Ra)3 in which Z is nitrogen or phosphorus and each Ra independently represents a hydrogen atom;
- an alkyl group having from 1 to 20 carbon atoms optionally substituted by one or more phenyl groups in which each phenyl group may be optionally substituted by one or more C1-12 alkyl groups and/or halogen atoms;
- a phenyl group optionally substituted by one or more C1-12 alkyl groups and/or halogen atoms;
- a C5-7 cycloalkyl group;
- or two Ra's together represent an alkylene group having from 4 to 6 carbon atoms one or more of which may be replaced by an oxygen or a sulphur atom
- and wherein the curable seamless modelling paste has a density of between 1.1-1.6 g/cm3 and the curable seamless modelling paste after curing has a heat deflection temperature above 100° C.
Dependencies are inferred from the claim text.