A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes a photosensitive film formation unit, a cleaning-drying processing unit, a thermal processing unit, and a development processing unit, the method comprising the steps of:
- forming a photosensitive film made of photosensitive material on an upper surface of the substrate by the photosensitive film formation unit before exposure processing by the exposure device;
- transporting the substrate after the formation of the photosensitive film by the photosensitive film formation unit to the exposure device;
- transporting the substrate after the exposure processing by the exposure device from the exposure device to the cleaning-drying processing unit;
- rotating the substrate after the exposure processing about a vertical axis while holding the substrate substantially horizontally in the cleaning-drying processing unit;
- supplying a cleaning liquid onto the photosensitive film formed on the upper surface of the substrate being rotated in the cleaning-drying processing unit;
- forming a liquid layer of the cleaning liquid having an upper surface that is exposed to atmosphere and in a free state, on the photosensitive film formed on the upper surface of the substrate by adjusting a rotation speed of the substrate in the cleaning-drying processing unit, the liquid layer of the cleaning liquid being formed to cover the entire upper surface of the substrate;
- stopping the supply of the cleaning liquid after forming the liquid layer of the cleaning liquid;
- supplying an inert gas from a nozzle for drying processing to a center of the liquid layer on the photosensitive film on the substrate such an opening is formed at the center of the liquid layer on the photosensitive film on the substrate, and the opening is enlarged with the liquid layer maintaining an annular shape in the cleaning-drying processing unit while the upper surface of the liquid layer on the photosensitive film on the substrate is exposed to atmosphere and is in a free state, after the supply of the cleaning liquid is stopped, the opening formed in the liquid layer being enlarged by a centrifugal force without the nozzle for drying processing being moved;
- removing the liquid layer on the photosensitive film on the substrate by increasing the rotation speed of the substrate after the opening formed in the liquid layer is enlarged such that the liquid layer is present only on a peripheral portion of the substrate;
- transporting the substrate after the removal of the liquid layer by the cleaning- drying processing unit from the cleaning-drying processing unit to the thermal processing unit;
- applying thermal processing to the substrate after the removal of the liquid layer by the thermal processing unit;
- and
- applying development processing by the development processing unit to the substrate after the thermal processing.