Glass substrate polishing method, package manufacturing method, piezoelectric vibrator, oscillator, electronic device and radio timepiece
AssigneeSeiko Instruments Inc.
InventorsYouichi Fujihira, Kazuyoshi Sugama
Life of this patent
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Abstract
A glass substrate polishing method having polishing processes for polishing a glass substrate surface while supplying a polishing agent. The glass substrate polishing method is characterized in that the polishing processes include a first polishing process in which the surface of the glass substrate is polished using a first polishing pad made from a polishing cloth and a second polishing process in which the surface of the glass substrate is polished using a second polishing pad made from urethane foam.
Claims12
A glass substrate polishing method including polishing processes for polishing a surface of a glass substrate while supplying a polishing agent, the glass substrate polishing method comprising:
- polishing the surface of the glass substrate with a first polishing process using a first polishing pad comprising a polishing cloth, and subsequently polishing the surface of the glass substrate with a second polishing process using a second polishing pad comprising urethane foam, where the second polishing pad has a higher degree of hardness than the first polishing pad.
A glass substrate polishing method including polishing processes for polishing a surface of a glass substrate while supplying a polishing agent, the glass substrate polishing method comprising:
- forming a recessed portion having a division wall on the surface of the glass substrate, where the division wall surrounds a periphery of the recessed portion;
- and
- polishing a tip end surface of a division wall with a first polishing process using a first polishing pad comprising a polishing cloth, and with a second polishing process using a second polishing pad comprising urethane foam.
A glass substrate polishing method including polishing processes for polishing a surface of a glass substrate while supplying a polishing agent, the glass substrate polishing method comprising:
- polishing the surface of the glass substrate with a first polishing process using a first polishing pad comprising a polishing cloth, and polishing the surface of the glass substrate with a second polishing process using a second polishing pad comprising urethane foam,
- wherein the first polishing process and the second polishing process comprise using a two-sided polishing device and simultaneously polishing a rear surface of the glass substrate.
Dependencies are inferred from the claim text.