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US 8,539,907 B2Granted
Apparatus for chemical bath deposition between two covers, wherein a cover is a substrate
AssigneeIndustrial Technology Research Institute
InventorsWei-Tse Hsu, Chung-Wen Lan, Yi-Song Luo
Life of this patent
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Abstract
The invention provides a film deposition apparatus, which includes a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, and the first cover has at least two holes, and a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover form a film deposition space.
Claims15
An apparatus for chemical bath deposition, comprising:
- a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, the second cover is a substrate for film deposition using a solution, and the first cover has at least two holes;
- a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover together form a film deposition space for containing the solution, arranged such that the second cover is horizontally disposed during the film deposition and removable from the first cover subsequent to the film deposition;
- and
- a heater, wherein the second cover is disposed on the heater.
1 more element
Dependencies are inferred from the claim text.