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US 8,527,255 B2Granted
Methods and systems for lithography process window simulation
AssigneeASML Netherlands B.V.
InventorsJun Ye, Yu Cao, Hanying Feng
Life of this patent
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Abstract
A method of efficient simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process.
Claims18
A method implemented by a computer comprising:
- identifying a model of a lithographic process;
- using, by the computer, the model to generate a function that simulates an image produced by the lithographic process, the function having one or more variables representing process window variations from a nominal process condition associated with the lithographic process;
- generating, using the computer, a plurality of simulated images utilizing the generated function, the plurality of simulated images respectively corresponding to a plurality of different lithographic process conditions that are variations from the nominal process condition;
- and
- analyzing the plurality of simulated images to determine a process window associated with the lithographic process.
2 more elements
A method implemented by a computer comprising:
- identifying a model of a lithographic process;
- identifying a set of optical conditions associated with the lithographic process;
- pre-computing, by the computer, a set of transmission coefficients associated with the model and the identified set of optical conditions;
- using, by the computer, the set of transmission coefficients to generate a function that simulates an image produced by the lithographic process, the function having one or more variables representing process window variations from a nominal process condition associated with the lithographic process;
- generating, using the computer, a plurality of simulated images utilizing the generated function, the plurality of simulated images respectively corresponding to a plurality of different lithographic process conditions that are variations from the nominal process condition;
- and
- analyzing the plurality of simulated images to determine a process window associated with the lithographic process.
4 more elements
Dependencies are inferred from the claim text.