Spatial map of mask-pattern defects
AssigneeSynopsys, Inc.
InventorsJun Peng, Guoqiang Bai, Xin Zhou
Life of this patent
Estimating the term…
Abstract
A technique for providing information about defects in a mask pattern is described. In this technique, defects in the mask pattern may be determined based on differences between a calculated pattern produced at an image plane in the photolithographic process, when the mask pattern, illuminated by an associated source pattern, is at an object plane in the photolithographic process, and a target pattern that excludes the defects. Then the defect information may be provided to the user, such as a spatial map of the determined defects, where the spatial map is associated with at least the portion of the mask pattern.
Claims17
A computer-implemented method for providing a spatial map of defects in at least a portion of a mask pattern, comprising:
- receiving the mask pattern for use in a photolithographic process;
- using the computer, calculating a simulated wafer pattern based on a model of a photoresist used in the photolithographic process, the calculated simulated wafer pattern produced at an image plane in the photolithographic process when at least the portion of the mask pattern, illuminated by an associated source pattern, is at an object plane in the photolithographic process;
- determining the defects in at least the portion of the mask pattern based on differences between the calculated simulated wafer pattern and a target pattern, wherein the target pattern excludes the defects;
- and
- providing an image of a spatial map for presentation in a graphical user interface associated with a mask-pattern analysis software, the spatial map visually representing the determined defects in at least the portion of the mask pattern.
A computer-program product for use in conjunction with a computer system, the computer-program product comprising a non-transitory computer-readable storage medium and a computer-program mechanism embedded therein to provide a spatial map of defects in at least a portion of a mask pattern, the computer-program mechanism including:
- instructions for receiving the mask pattern for use in a photolithographic process;
- instructions for calculating a simulated wafer pattern based on a model of a photoresist used in the photolithographic process, the calculated simulated wafer pattern produced at an image plane in the photolithographic process when at least the portion of the mask pattern, illuminated by an associated source pattern, is at an object plane in the photolithographic process;
- instructions for determining the defects in at least the portion of the mask pattern based on differences between the calculated simulated wafer pattern and a target pattern, wherein the target pattern excludes the defects;
- and
- instructions for providing an image of a spatial map for presentation in a graphical user interface associated with a mask-pattern analysis software, the spatial map visually representing the determined defects in at least the portion of the mask pattern.
A computer system for providing a spatial map of defects in at least a portion of a mask pattern, the computer system comprising:
- at least one processor;
- at least one memory;
- and
- at least one program module, the program module stored in the memory and configured to be executed by the processor, the program module including:
- instructions for receiving the mask pattern for use in a photolithographic process;
- instructions for calculating a simulated wafer pattern based on a model of a photoresist used in the photolithographic process, the calculated simulated wafer pattern produced at an image plane in the photolithographic process when at least the portion of the mask pattern, illuminated by an associated source pattern, is at an object plane in the photolithographic process;
- instructions for determining the defects in at least the portion of the mask pattern based on differences between the calculated simulated wafer pattern and a target pattern, wherein the target pattern excludes the defects;
- and
- instructions for providing an image of a spatial map for presentation in a graphical user interface associated with a mask-pattern analysis software, the spatial map visually representing the determined defects in at least the portion of the mask pattern.
A graphical user interface associated with mask-pattern analysis software, comprising:
- a window that includes an image of a spatial map presented in the graphical user interface, the spatial map visually representing the determined defects in at least a portion of a mask pattern for use in a photolithographic process, wherein the defects in at least the portion of the mask pattern are determined based on differences between a calculated simulated wafer pattern and a target pattern that excludes the defects;
- and
- wherein the calculated simulated wafer pattern is based on a model of a photoresist used in the photolithographic process, the calculated simulated wafer pattern produced at an image plane in the photolithographic process when at least the portion of the mask pattern, illuminated by an associated source pattern, is at an object plane in the photolithographic process.
Dependencies are inferred from the claim text.