Back to results
US 8,508,713 B2Granted
Exposure apparatus, exposure method, and method for producing device
AssigneesNikon Corporation, Nikon Engineering Co., Ltd.
InventorsHiroyuki Nagasaka, Takeshi Okuyama
Life of this patent
Estimating the term…
Abstract
A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.
Claims15
A lithographic projection apparatus in which a pattern is projected onto a substrate through a liquid confined to a space adjacent the substrate, the apparatus comprising:
- a projection system by which the pattern is projected onto the substrate;
- a liquid diverter in the space to promote liquid flow across the space from a first side of the space to a second side of the space, the first side and the second side being separated along a circumference of the space, the liquid diverter having an upper surface and a lower surface, the upper surface being provided such that the upper surface faces an end surface of the projection system and a gap is formed between the upper surface and the end surface of the projection system, and the lower surface being provided such that the substrate faces the lower surface and a gap is formed between the lower surface and the substrate when projecting the pattern onto the substrate;
- a liquid confinement member with which the liquid is confined to the space, the liquid confinement member including the liquid diverter;
- a liquid supply inlet from which the liquid is supplied to the gap between the upper surface and the end surface of the projection system;
- and
- an extraction port from which the supplied liquid is removed, wherein
- when projecting the pattern onto the substrate, the extraction port removes the liquid which comes from the gap between the upper surface of the liquid diverter and the end surface of the projection system, via the gap between the lower surface of the liquid diverter and the substrate, to a gap between the extraction port and the substrate.
4 more elements
A device manufacturing method, comprising:
- projecting a patterned beam of radiation using a projection system onto a substrate through a liquid provided in a space adjacent the substrate, wherein flow of the liquid across the space is promoted by a liquid diverter in the space, the liquid diverter having an upper surface and a lower surface, the upper surface being provided such that the upper surface faces an end surface of the projection system and a gap is formed between the upper surface and the end surface of the projection system, and the lower surface being provided such that the substrate faces the lower surface and a gap is formed between the lower surface and the substrate when projecting the patterned beam onto the substrate;
- supplying the liquid to the gap between the upper surface and the end surface of the projection system;
- and
- removing, from an extraction port, the liquid which comes from the gap between the upper surface of the liquid diverter and the end surface of the projection system, via the gap between the lower surface of the liquid diverter and the substrate, to a gap between the extraction port and the substrate.
1 more element
Dependencies are inferred from the claim text.