Antireflective compositions and methods of using same
AssigneeAZ Electronic Materials USA Corp.
InventorsHuirong Yao, Guanyang Lin, Jianhui Shan, JoonYeon Cho, Salem K. Mullen
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Abstract
A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein U1 and U2 are independently a C1-C10 alkylene group; V is selected from a C1-C10 alkylene, arylene and aromatic alkylene; W is selected from H, C1-C10 alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.
Claims15
An antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, and (c) at least one polymer,
- wherein U1 and U2 are independently a C1-C10 alkylene group;
- V is selected from a C1-C10 alkylene, arylene and aromatic alkylene;
- W is selected from H, alkyl, aryl, alkylaryl and V—OH;
- Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m is 1.
Dependencies are inferred from the claim text.