Photomask blank, photomask, and method for manufacturing photomask blank

A photomask blank for producing a photomask to which an ArF excimer laser light is applied, wherein:

• a light-shielding film is provided on a surface of a light transmissive substrate;
• the light-shielding film has a laminated structure in which a back-surface antireflection layer, a light-shielding layer and a front-surface antireflection layer are laminated in this order from the surface of the light transmissive substrate;
• a first thickness, which is of the entire light-shielding film, is 70 nm or less;
• the back-surface antireflection layer is made of a first antireflection film containing a first metal and has a first etching rate;
• the front-surface antireflection layer is made of a second antireflection film containing a second metal and has a third etching rate;
• the light-shielding layer contains a same metal as that contained in either the back-surface antireflection layer or the front-surface antireflection layer, where the light-shielding layer has a second etching rate;
• a second thickness, which is of the light-shielding layer, is 45% or less of the first thickness, which is of the entire light-shielding film;
• and
• the etching rates of the back-surface antireflection layer, the light-shielding layer and the front-surface antireflection layer have the following relationship:
• Second etching rate<First etching rate<Third etching rate.