Apparatus and method to control vacuum at porous material using multiple porous materials
AssigneeNikon Corporation
InventorsAlex Ka Tim Poon, Leonard Wai Fung Kho, Derek Coon
Life of this patent
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AssigneeNikon Corporation
InventorsAlex Ka Tim Poon, Leonard Wai Fung Kho, Derek Coon
Estimating the term…
An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and first and second liquid-permeable members. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. The second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber.
An immersion liquid confinement apparatus for confining an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system, the apparatus also recovering the immersion liquid from the immersion area, the apparatus comprising:
An immersion liquid confinement apparatus for confining an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system, the apparatus also recovering the immersion liquid from the immersion area, the apparatus comprising:
An immersion lithography apparatus comprising:
A method of recovering immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system, the method comprising:
Dependencies are inferred from the claim text.