Device using oxide semiconductor, display device, and electronic apparatus
AssigneeSony Corporation
InventorsTetsuo Minami, Katsuhide Uchino
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Abstract
Disclosed herein is a device using an oxide semiconductor, the device including a circuit part configured to include a thin film transistor using the oxide semiconductor as a channel material, wherein the circuit part has a lower interconnect, an upper interconnect, and an interlayer insulating film, the interlayer insulating film includes an oxide semiconductor layer and a channel protective layer, and the channel protective layer is interposed between an outer circumferential surface of a rising part of the oxide semiconductor layer corresponding to thickness of the lower interconnect and the upper interconnect.
Claims12
A device using an oxide semiconductor, the device comprising:
- a circuit part configured to include a thin film transistor using the oxide semiconductor as a channel material and at least one wiring intersection portion,
- wherein the wiring intersection portion has an interlayer insulating film between a lower interconnect and an upper interconnect, the upper interconnect intersecting the lower interconnect,
- wherein the interlayer insulating film includes an oxide semiconductor layer and a channel protective layer, the oxide semiconductor layer and the channel protective layer being stacked over the lower interconnect with intermediary of a gate insulating film, and
- wherein the channel protective layer is interposed between an outer circumferential surface of a rising part of the oxide semiconductor layer corresponding to thickness of the lower interconnect and the upper interconnect.
A device using an oxide semiconductor, the device comprising:
- a circuit part configured to include a thin film transistor using the oxide semiconductor as a channel material,
- wherein the circuit part has an interlayer insulating film between a lower interconnect and an upper interconnect, the upper interconnect intersecting the lower interconnect, and
- wherein the interlayer insulating film is over the lower interconnect with intermediary of a gate insulating film.
A device using an oxide semiconductor, the device comprising:
- a circuit part configured to include a thin film transistor and at least one wiring intersection portion,
- wherein the wiring intersection portion has an interlayer insulating film between a lower interconnect and an upper interconnect, the upper interconnect intersecting the lower interconnect, and
- wherein the interlayer insulating film includes an oxide semiconductor layer and a protective layer, the oxide semiconductor layer and the protective layer being stacked over the lower interconnect with intermediary of a gate insulating film, and
- wherein the protective layer is interposed between an outer circumferential surface of a rising part of the oxide semiconductor layer and the upper interconnect.
A display device comprising:
- a pixel array part configured to be formed by arranging pixels each including an electrooptical element;
- and
- a circuit part configured to include a thin film transistor using an oxide semiconductor as a channel material and at least one wiring portion,
- wherein the wiring portion has an interlayer insulating film between a lower interconnect and a upper interconnect, the upper interconnect intersecting the lower interconnect, and
- wherein the interlayer insulating film includes an oxide semiconductor layer and a channel protective layer, the oxide semiconductor layer and the channel protective layer being stacked over the lower interconnect with intermediary of a gate insulating film, and
- wherein the channel protective layer is interposed between an outer circumferential surface of a rising part of the oxide semiconductor layer corresponding to thickness of the lower interconnect and the upper interconnect.
A display device comprising:
- a pixel array part configured to be formed by arranging pixels each including an electrooptical element;
- and
- a circuit part configured to include a thin film transistor using an oxide semiconductor as a channel material,
- wherein the circuit part has an interlayer insulating film between a lower interconnect and an upper interconnect, the upper interconnect intersecting the lower interconnect, and
- wherein the interlayer insulating film over the lower interconnect with intermediary of a gate insulating film.
Electronic apparatus having a display device comprising:
- a pixel array part configured to be formed by arranging pixels each including an electrooptical element;
- and
- a circuit part configured to include a thin film transistor using an oxide semiconductor as a channel material and at least one wiring intersection portion,
- wherein the wiring intersection portion has an interlayer insulating film between a lower interconnect and an upper interconnect, the upper interconnect intersecting the lower interconnect, and
- wherein the interlayer insulating film includes an oxide semiconductor layer and a channel protective layer, the oxide semiconductor layer and the channel protective layer being stacked over the lower interconnect with intermediary of a gate insulating film, and
- wherein the channel protective layer is interposed between an outer circumferential surface of a rising part of the oxide semiconductor layer corresponding to thickness of the lower interconnect and the upper interconnect.
Electronic apparatus having a display device comprising:
- a pixel array part configured to be formed by arranging pixels each including an electrooptical element;
- and
- a circuit part configured to include a thin film transistor using an oxide semiconductor as a channel material,
- wherein the circuit part has an interlayer insulating film between a lower interconnect and an upper interconnect, the upper interconnect intersecting the lower interconnect, and
- wherein the interlayer insulating film is over the lower interconnect with intermediary of a gate insulating film.
Dependencies are inferred from the claim text.