Photosensitive resin composition and preparation method
AssigneeBoe Technology Group Co., Ltd.
InventorJiuxia Yang
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AssigneeBoe Technology Group Co., Ltd.
InventorJiuxia Yang
Estimating the term…
A photosensitive resin composition comprises: 0.01 wt %-10 wt % of reflective particles; 0 wt %-12 wt % of pigment; 1 wt %-10 wt % of dispersant; 1.5 wt %-5 wt % of dispersion resin; 2 wt %-25 wt % of optically active polymer; 1 wt %-22 wt % of optical active monomer; 0.4 wt %-5 wt % of epoxy resin; 5 wt %-85 wt % of solvent; 0.1 wt %-3 wt % of photoinitiator; and 0.01 wt %-3.5 wt % of additives.
A method of preparing a photosensitive resin composition, comprising:
A method of preparing a photosensitive resin composition, comprising:
Dependencies are inferred from the claim text.
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Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor: filters, e.g.…
With binders: the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Photosensitive materials: macromolecular compounds which are rendered insoluble or differentially wettable
Photomechanical production of textured or patterned surfaces
About 4 years 9 months of term left · ends 16 Jul 2031 (estimated)
Embodiments of the invention are related to a photosensitive resin composition and a preparation method for manufacturing the same.
High color saturation and high transmissivity are important indexes to evaluate liquid crystal displays (LCDs). The performance of a color filter element used in a LCD mainly depends on the nature of the colored photosensitive resin composition and the filming process of the color filter element. To ensure heat resistance, chemical resistance and other properties of the color filter during the forming process, the colored photosensitive resin composition is required to have suitable properties such as heat resistance, light resistance, chemical resistance, transmittance, and colorimetric properties.
During the forming process of a color filter element which employs a photosensitive resin composition, the photosensitive resin composition is UV cured. However, when the conventional photosensitive resin compositions, especially the photosensitive resin compositions comprising a blue, green or black pigment, are used, high energy UV exposure is required and the UV efficiency is low because the composition strongly absorbs the ultraviolet light.
The present invention will become more fully understood from the detailed description given hereinafter and the accompanying drawings which are given by way of illustration only, and thus are not limitative of the present invention and wherein:
FIG. 1 is a process flow chart of preparation method example 1 of a photosensitive resin composition; and
FIG. 2 is a process flow chart of preparation method example 2 of a photosensitive resin composition.
Further scope of applicability of the present invention will become apparent from the detailed description given hereinafter. However, it should be understood that the detailed description and specific examples, while indicating preferred embodiments of the invention, are given by way of illustration only, since various changes and modifications within the spirit and scope of the invention will become apparent to those skilled in the art from the following detailed description.
One embodiment of the present invention provides a photosensitive resin composition, which comprises: 0.01 wt %-10 wt % of reflective particles; 0 wt %-12 wt % of pigment; 1 wt %-10 wt % of dispersant; 1.5 wt %-5 wt % of dispersion resin; 2 wt %-25 wt % of optically active polymer; 1 wt %-22 wt % of optical active monomer; 0.4 wt %-5 wt % of epoxy resin; 5 wt %-85 wt % of solvent; 0.1 wt %-3 wt % of photoinitiator; and 0.01 wt %-3.5 wt % of additives. Here, all the weight percents are based on the total weight of the photosensitive resin composition.
The weight percentage of the reflective particles is preferably 0.03 wt %-10 wt %. The reflective particles are selected from the group consisting of titanium dioxide, barium sulfate, magnesium oxide, silicon oxide, zinc oxide, lithopone and zirconia. Furthermore, in order to mix reflective particles well with other components to form the photosensitive resin composition, the reflective particles preferably comprises nanometer reflective particles.