Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus

A method comprising:

• disposing a mask on a surface of a first layer;
• forming at least one recess in the surface of the first layer at locations not covered with the mask, the first layer configured to receive an article by contact at a second surface to electrostatically clamp an article to an article support;
• providing a coating of an electrode material on a surface of the mask and in the at least one recess;
• removing the mask from the surface of the first layer;
• and
• bonding the first layer with a second layer.