Emissivity profile control for thermal uniformity
AssigneeIntermolecular, Inc.
InventorRajesh Kelekar
Life of this patent
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Abstract
A substrate for processing in a heating system is disclosed. The substrate includes a bottom portion for absorbing heat from a radiating heat source, the bottom portion having a first region having a first emissivity and a second region having a second emissivity less than the first emissivity. The first region and the second region promote thermal uniformity of the substrate by compensating for thermal non-uniformity of the radiating heat source.
Claims11
A susceptor for heating a substrate in an induction heating system, said susceptor having a top surface for transmitting heat to the substrate, the top surface having multiple regions including at least a first region having a first emissivity and a second region having a second emissivity different than the first emissivity
- wherein the second region has a thin film coating deposited thereon;
- wherein the first region comprises a graphite material;
- and
- wherein the thin film coating comprises a metallic material selected from the group consisting of silver, copper, or molybdenum.
A method for heating a substrate in an induction heating system, comprising:
- disposing a substrate above a susceptor;
- inductively heating the susceptor, the inductive heating providing non-uniform heating of the susceptor;
- compensating for the non-uniform heating of the susceptor to provide substantially uniform heating of the substrate, the compensating comprising performing one of variably absorbing heat at a bottom surface of the substrate or variably transmitting heat of the susceptor at a top surface of the susceptor;
- wherein variably absorbing heat at the bottom surface of the substrate includes absorbing heat through a first bottom surface portion having a first emissivity and absorbing heat through a second bottom surface portion having a second emissivity less than the first emissivity.
Dependencies are inferred from the claim text.