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US 8,465,588 B2Granted
Ammonothermal method for growth of bulk gallium nitride
AssigneeSoraa, Inc.
InventorsChristiane Poblenz, James S. Speck, Derrick S. Kamber
Life of this patent
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Abstract
A high-quality, large-area seed crystal for ammonothermal GaN growth and method for fabricating. The seed crystal comprises double-side GaN growth on a large-area substrate. The seed crystal is of relatively low defect density and has flat surfaces free of bowing. The seed crystal is useful for producing large-volume, high-quality bulk GaN crystals by ammonothermal growth methods for eventual wafering into large-area GaN substrates for device fabrication.
Claims45
A method of fabricating crystalline material comprising:
- providing a crystalline substrate having a first surface and a second opposite surface;
- forming a first layer of crystalline material containing at least a Group III element and N having a first thickness overlying the first surface of the substrate;
- and
- forming a second layer of crystalline material overlying the second surface of the substrate, the second crystalline material having substantially the same first thickness and having substantially the same composition as the first layer of crystalline material, such that the first crystalline material and second crystalline material are substantially free from bow;
- wherein the first layer is formed by a process selected from MOCVD, HVPE, LPE, and MBE;
- and the second layer is formed by a process selected from MOCVD, HVPE, LPE, and MBE.
3 more elements
An epitaxial layer grown on crystalline material wherein the crystalline material is fabricated by a method comprising:
- providing a crystalline substrate having a first surface and a second opposite surface;
- forming a first layer of crystalline material containing at least a Group III element and N having a first thickness overlying the first surface of the substrate;
- and
- forming a second layer of crystalline material overlying the second surface of the substrate, the second crystalline material having substantially the same first thickness and having substantially the same composition as the first layer of crystalline material, such that the first crystalline material and second crystalline material are substantially free from bow.
1 more element
A method of fabricating crystalline material comprising:
- providing a first crystalline substrate material having a first surface and a second surface;
- forming a first thickness of first crystalline material overlying the first surface of the first crystalline substrate material, the first thickness of first crystalline material having a first orientation;
- providing a second crystalline substrate material having a first surface and a second surface;
- forming a second thickness of second crystalline material overlying the first surface of the second crystalline substrate material, the second thickness of second crystalline material having a second orientation;
- and
- attaching the first crystalline substrate and the second crystalline substrate to form a composite substrate such that the composite substrate is configured to be substantially free from bow.
3 more elements
A method of fabricating crystalline material containing at least a Group III element and N comprising:
- providing a crystalline substrate having a first surface and a second opposite surface;
- forming a first layer of crystalline material having a first thickness overlying the first surface of the crystalline substrate;
- and
- forming a second layer of crystalline material overlying the second surface of the crystalline substrate, the second layer of crystalline material having substantially the same first thickness and having substantially the same composition as the first layer of crystalline material overlying the first surface of the crystalline substrate, such that the crystalline substrate together with the first layer of crystalline material and the second layer of crystalline material creates a structure that is substantially free from bow.
1 more element
A method for fabricating crystalline material comprising:
- providing a first crystalline substrate material having a first surface and a second surface;
- forming a first thickness of first crystalline material overlying the first surface of the first crystalline substrate material, the first thickness of first crystalline material having a first orientation;
- providing a second crystalline substrate material having a first surface and a second surface;
- forming a second thickness of second crystalline material overlying the first surface of the second crystalline substrate material, the second thickness of second crystalline material having a second orientation;
- and
- attaching the first crystalline substrate and the second crystalline substrate at their second surfaces, such that the first crystalline material and second crystalline material are substantially free from bow.
3 more elements
A method for fabricating crystalline material comprising:
- providing a crystalline substrate material having a first surface and a second surface;
- forming a first crystalline material overlying the first surface of the crystalline substrate material, the first crystalline material having a first lattice constant;
- and
- forming a second crystalline material overlying the second surface of the crystalline substrate material, the second crystalline material having a second lattice constant, such that the lattice constant of the second crystalline material is substantially the same as the lattice constant of the first crystalline material.
1 more element
A method of fabricating crystalline material comprising:
- providing a first crystalline substrate material having a first surface and a second surface;
- forming a first thickness of first crystalline material overlying the first surface of the first crystalline substrate material, the first thickness of first crystalline material having a first orientation;
- providing a second crystalline substrate material having a first surface and a second surface;
- forming a second thickness of second crystalline material overlying the first surface of the second crystalline substrate material, the second thickness of second crystalline material having a second orientation;
- and
- forming a composite structure containing the first crystalline substrate material, the first crystalline material, the second crystalline substrate material, and the second crystalline material such that the surface of the first crystalline material is disposed opposite the surface of the second crystalline material.
3 more elements
A method of fabricating crystalline material comprising:
- providing a first crystalline substrate material having a first surface and a second surface;
- forming a first thickness of first crystalline material overlying the first surface of the first crystalline substrate material, the first crystalline material having a first lattice constant;
- providing a second crystalline substrate material having a first surface and a second surface;
- forming a second thickness of second crystalline material overlying the first surface of the second crystalline substrate material, the second crystalline material having a second lattice constant, such that the lattice constant of the second crystalline material is substantially the same as the lattice constant of the first crystalline material;
- and
- forming a composite structure containing the first crystalline substrate material, the first crystalline material, the second crystalline substrate material, and the second crystalline material such that the surface of the first crystalline material is disposed opposite the surface of the second crystalline material.
3 more elements
A method of fabricating crystalline material comprising:
- providing a first crystalline substrate material having a first surface and a second surface;
- forming a first thickness of first crystalline material overlying the first surface of the first crystalline substrate material, the first crystalline material having a first coefficient of thermal expansion;
- providing a second crystalline substrate material having a first surface and a second surface;
- forming a second thickness of second crystalline material overlying the first surface of the second crystalline substrate material, the second crystalline material having a second coefficient of thermal expansion, such that the coefficient of thermal expansion of the second crystalline material is substantially the same as the coefficient of thermal expansion of the first crystalline material;
- and
- forming a composite structure containing the first crystalline substrate material, the first crystalline material, the second crystalline substrate material, and the second crystalline material such that the surface of the first crystalline material is disposed opposite the surface of the second crystalline material.
3 more elements
Dependencies are inferred from the claim text.