Dual-pattern coloring technique for mask design
AssigneeCadence Design Systems, Inc.
InventorsMin Cao, Jeffrey Markham
Life of this patent
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Abstract
A hierarchical schematic design editor displays mask layers for each shape as mask specific colors and alerts a user to mask layer conflicts during the design and editing process. According to an embodiment, mask colors may be assigned at the time the shapes or geometries and cells are placed in a circuit design layout, or when a mask layer condition indicating that two or more shapes should be set to different mask layers is detected. In an embodiment, if the distance between two shapes is less than a predetermined threshold, those shapes may cause a mask layer condition. Shapes may be grouped to facilitate mask layer condition detection and mask layer assignment.
Claims13
A method for using a processor to edit a schematic comprising:
- upon addition of a shape to the schematic, detecting, using the processor, a mask layer condition for a plurality of shapes organized in a hierarchy during editing of the schematic;
- upon detection of the mask layer condition, grouping the plurality of shapes and the added shape in a cluster;
- assigning a mask layer to each of the grouped shapes;
- and
- displaying the mask layer for each of the grouped shapes when the mask layer is assigned.
A non-transitory computer readable medium storing instructions that when executed by a processor perform a method to edit a schematic comprising
- upon addition of a shape to the schematic, detecting, using the processor, a mask layer condition for a plurality of shapes organized in a hierarchy during editing of the schematic;
- upon detection of the mask layer condition, grouping the plurality of shapes and the added shape in a cluster;
- assigning a mask layer to each of the grouped shapes;
- and
- displaying the mask layer for each of the grouped shapes when the mask layer is assigned.
Dependencies are inferred from the claim text.