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US 8,426,928 B2Granted
Device with microstructure and method of forming such a device
AssigneeNXP B.V.
InventorsJohannes van Wingerden, Greja Johanna Adriana Maria Verheijden, Gerhard Koops, Jozef Thomas Martinus van Beek
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Abstract
Disclosed is a device comprising a substrate carrying a microscopic structure in a cavity capped by a capping layer including a material of formula SiNxHy, wherein x>1.33 and y>0. A method of forming such a device is also disclosed.
Claims17
A device comprising:
- a substrate carrying a micromachined device in a cavity capped by a capping layer including a material of formula SiNxHy, wherein 1.35≦x≦1.65 and 0.2≦y≦0.8.
A device comprising:
- a substrate;
- and
- a structure located on the substrate and configured and arranged to form a cavity that is subject to outgassing levels of less than 1.0 mTorr at 450° C., the structure including
- a capping layer forming a cavity between the substrate and the capping layer,
- a sacrificial layer extending over the substrate and beneath the capping layer, wherein at least a portion of the sacrificial layer is removed from the cavity, and
- a further layer extending over the sacrificial layer and beneath the capping layer, the further layer including one or more microscopic mechanical devices.
3 more elements
Dependencies are inferred from the claim text.