Mask system employing substantially circular optical proximity correction target and method of manufacture thereof
AssigneeGlobalfoundries Singapore Pte. Ltd.
InventorsSia Kim Tan, Gek Soon Chua, Kwee Liang Martin Yeo, Ryan Khoon Khye Chong, Moh Lung Ling
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Abstract
A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.
Claims20
A method of manufacture of an integrated circuit device comprising:
- providing design data;
- generating a substantially circular optical proximity correction target from the design data;
- biasing a segment of the substantially circular optical proximity correction target by extending an arc of the substantially circular optical proximity correction target, while maintaining a dimension of a different segment within the substantially circular optical proximity correction target;
- generating mask data, based on the shape produced by biasing the segment of the substantially circular optical proximity correction target, by using a computer aided design system;
- and
- making a mask from the mask data.
A method of manufacture of an integrated circuit device comprising:
- providing a contact hole design;
- generating a substantially circular optical proximity correction target of the contact hole design;
- segmenting the substantially circular optical proximity correction target;
- biasing a segment of the substantially circular optical proximity correction target by extending an arc of the substantially circular optical proximity correction target, while maintaining a dimension of a different segment within the substantially circular optical proximity correction target;
- generating mask data, based on the shape produced by biasing the segment of the substantially circular optical proximity correction target, by using a computer aided design system;
- and
- making a mask from the mask data.
A method of manufacture of an integrated circuit device comprising:
- providing a contact hole design;
- generating a substantially circular optical proximity correction target of the contact hole design;
- segmenting the substantially circular optical proximity correction target;
- biasing a segment of the substantially circular optical proximity correction target by extending an arc perimeter of the substantially circular optical proximity correction target in a radial direction, while maintaining a dimension of a different segment within the substantially circular optical proximity correction target;
- generating mask data, based on the shape produced by biasing the segment of the substantially circular optical proximity correction target, by using a computer aided design system;
- and
- making a mask from the mask data.
Dependencies are inferred from the claim text.