Device manufacturing method, control system, computer program and computer-readable medium
AssigneeASML Netherlands B.V.
InventorMartin Jules Marie-Emile De Nivelle
Life of this patent
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Abstract
A device manufacturing method in a lithographic apparatus includes determining a plurality of positions on a substrate. The plurality of positions on a measurement substrate are scanned in a first direction to determine a first substrate map of the substrate levels of the measurement substrate. The plurality of positions on the measurement substrate are scanned in a second direction to determine a second substrate map of the substrate levels of the measurement substrate. A difference map is produced that includes information of the difference in measurement substrate surface level using the first substrate map and the second substrate map.
Claims11
A device manufacturing method comprising:
- scanning a plurality of positions on a measurement substrate in a first direction to determine a first substrate map;
- scanning a plurality of positions on the measurement substrate in a second direction to determine a second substrate map, wherein strokes of the first substrate map are scanned interleaved with strokes of the second substrate map;
- determining a difference map comprising information corresponding to a difference between the first substrate map and the second substrate map;
- exposing the substrate to a patterned beam of radiation;
- and
- controlling the relative positions of the substrate and the patterned beam of radiation based upon the determined difference map.
A system for use in a lithographic apparatus comprising:
- a substrate table constructed to hold a substrate;
- an exposure system configured to expose the substrate to a patterned beam of radiation;
- a sensor system configured to measure a substrate surface at a measuring point of the sensor system;
- and
- a control system comprising a control unit arranged to:
- move at least one of the substrate table and the measurement point of the sensor system relatively,
- receive first measured substrate surface levels of a plurality of positions on the substrate, measured while moving at least one of the substrate table and the measurement point in a plurality of first directions corresponding to the plurality of positions,
- receive second measured substrate surface levels of the plurality of positions on the substrate, measured while moving at least one of the substrate table and the measurement point in a plurality of second directions corresponding to the plurality of positions, wherein strokes of the first measured substrate surface levels are measured interleaved with strokes of the second measured substrate surface levels,
- determine a difference map based on the difference between the first and second measured substrate surface levels, and
- control the relative positions of the substrate and the patterned beam of radiation based upon the determined difference map.
A non-transient computer-readable storage medium having a computer program code recorded thereon that, when executed by a processor, causes the processor to perform a method, the method comprising:
- scanning a plurality of positions on a measurement substrate in a first direction to determine a first substrate map;
- scanning a plurality of positions on the measurement substrate in a second direction to determine a second substrate map, wherein strokes of the first substrate map are scanned interleaved with strokes of the second substrate map;
- determining a difference map comprising information corresponding to a difference between the first substrate map and the second substrate map;
- exposing the substrate to a patterned beam of radiation;
- and
- controlling the relative positions of the substrate and the patterned beam of radiation based upon the determined difference map.
Dependencies are inferred from the claim text.