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US 8,411,251 B2Granted
Optical element and illumination optics for microlithography
AssigneeCarl Zeiss SMT GmbH
InventorMichael Gerhard
Life of this patent
Estimating the term…
Abstract
The disclosure relates to an optical element and illumination optics for microlithography. The optical element can be configured to influence a nominal beam angle, preset over a beam cross-section, of a radiation beam hitting the optical element. Moreover, the disclosure relates to an illumination optics for the microlithography with at least one such optical element and an illumination system for the microlithography with such an illumination optics.
Claims19
An optical element, comprising:
- a spatial optical structure configured to influence a nominal beam angle of a radiation beam when the spatial optical structure is exposed to the radiation beam;
- and
- an optical coating supported by the spatial optical structure, the optical coating being configured to generate a defined attenuation of parts of the radiation beam over a beam cross-section when exposed to the radiation beam, thereby influencing the nominal beam angle of the radiation beam,
- wherein optical effects of the spatial optical structure and the optical coating complement each other in influencing the nominal beam angle of the radiation beam, and
- wherein the optical coating is designed so that beam angles generated by the spatial optical structure that exceed a divergence angle limit are absorbed or reflected by the optical coating.
2 more elements
An optical element, comprising:
- a spatial optical structure configured to influence a nominal beam angle of a radiation beam when the spatial optical structure is exposed to the radiation beam;
- and
- an optical coating supported by the spatial optical structure, the optical coating being configured to generate a defined attenuation of parts of the radiation beam over a beam cross-section when exposed to the radiation beam, thereby influencing the nominal beam angle of the radiation beam,
- wherein optical effects of the spatial optical structure and the optical coating complement each other in influencing the nominal beam angle of the radiation beam, and
- wherein the optical coating is designed so that beam angles generated by the spatial optical structure that are below a divergence angle limit are reflected by the optical coating.
2 more elements
Dependencies are inferred from the claim text.