Composition for formation of resist protection film, and method for formation of resist pattern using the same

A composition for forming a resist protection film on a resist film,

• comprising:
• a. an alkali-soluble polymer;
• and b. an ether-based solvent, wherein
• said alkali-soluble polymer a. has at least one monomer unit represented by the following general formula A-1, and at least one monomer unit selected from the group consisting of the monomer units represented by the following general formulae A-3 and A-4 as a constitutional unit:
• in the above formulae, R1 is an alkylene group or a fluoroalkylene group having 1 to 6 carbon atoms, R2 are each independently hydrogen atoms or straight chain, branched chain or cyclic alkyl groups or fluoroalkyl groups having 1 to 6 carbon atoms, R5 and R7 are each independently an alkylene group or a fluoroalkylene group having 1 to 6 carbon atoms, R6 and R8 are each independently a straight chain, branched chain or cyclic fluoroalkyl group having 1 to 15 carbon atoms;
• wherein, a part of hydrogen atoms or fluorine atoms of the fluoroalkyl group may be substituted with a hydroxyl group, Z is an alkylene group having 1 to 2 carbon atoms or an oxygen atom, and n is an integer of 0 to 3, and
• wherein said ether-based solvent b. is at least one selected from diisopropyl ether and dibutyl ether.