Substrate processing apparatus, substrate processing method and storage medium
AssigneeTokyo Electron Limited
InventorKeigo Satake
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AssigneeTokyo Electron Limited
InventorKeigo Satake
Estimating the term…
Disclosed is a substrate processing apparatus capable of decreasing the frequency of shutdown of the apparatus due to lack of processing liquid in a processing liquid supply unit, as well as efficiently using the processing liquid to improve a yield ratio. The substrate processing apparatus includes a plurality of liquid processing units to conduct liquid processing of substrates a substrate carrying unit to carry the substrates in and out of the liquid processing units, a processing liquid supply unit to supply the liquid processing units with processing liquid, and a level gauge to detect an amount of the processing liquid remaining in the processing liquid reservoir of the processing liquid supply unit. The carry of the substrates in the liquid processing units is suspended when the level gauge detects that the amount of the processing liquid remaining in the processing liquid reservoir is below a predetermined threshold.
A substrate processing method using a substrate processing apparatus that includes a processing liquid supplying unit that stores and supplies a processing liquid, a level gauge that detects a level of the processing liquid at the processing liquid supplying unit, a plurality of liquid processing units, a flow rate meter installed at a distribution pipe provided between the processing liquid supplying unit and the plurality of liquid processing units, a plurality of branch pipes provided for each of the plurality of liquid processing units, and a plurality of flow rate gauges installed at each of the plurality of branch pipes, the substrate processing method comprising:
A non-transitory computer-readable recording medium storing a computer executable program that, when executed, causes a computer to perform a substrate processing method using a substrate processing apparatus that includes a processing liquid supplying unit that stores and supplies a processing liquid, a level gauge that detects a level of the processing liquid at the processing liquid supplying unit, a plurality of liquid processing units, a flow rate meter installed at a distribution pipe provided between the processing liquid supplying unit and the plurality of liquid processing units, a plurality of branch pipes provided for each of the plurality of liquid processing units, and a plurality of flow rate gauges installed at each of the plurality of branch pipes, the substrate processing method comprising:
Dependencies are inferred from the claim text.
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Apparatus for monitoring, sorting, marking, testing or measuring: process monitoring, e.g. flow or thickness monitoring
Generic processes or apparatus for the manufacture or treatment of devices covered
About 3 years 9 months of term left · ends 22 Jul 2030 (estimated)
1. Field of the Invention
The present invention relates to a substrate processing apparatus for conducting liquid processing of various types of substrates, such as semiconductor wafers, or glass substrates of liquid crystal panels, etc. More particularly, the present invention relates to a substrate processing apparatus for distributing and supplying processing liquid from a common processing liquid supply unit to a plurality of processing units.
2. Description of the Prior Art
The above and other objects, features and advantages of the present invention will be more apparent from the following detailed description taken in conjunction with the accompanying drawings, in which:
FIG. 1 is a conceptual top view showing a substrate processing apparatus according to the present invention;
FIG. 2 is a distribution diagram of pipes illustrating the structure of a processing liquid supply unit;
Hereinafter, an exemplary embodiment of the present invention will be described with reference to the accompanying drawings. In the following description and drawings, the same reference numerals are used to designate the same or similar components, and so repetition of the description on the same or similar components will be omitted.
FIG. 1 is a conceptual top view showing a substrate processing apparatus according to the present invention.
As shown in FIG. 1, the substrate processing apparatus 1 includes a substrate carrying-in/carrying-out unit 2 and a liquid processing unit 3.