Device for coating the outer edge of a substrate during microelectronics manufacturing

In a baffle for affecting the flow of a composition during application of the composition to a substrate having a maximum cross-sectional substrate dimension and an edge, the improvement comprising:

• an annular open-bottom base with upper and lower surfaces,
• said base including a continuous interior edge wall that intersects the upper and lower surfaces to define a base opening extending continuously between and through the upper surface and the lower surface so that the baffle is open at the lower surface,
• said base opening presenting an upright opening axis, with the opening having a cross-sectional dimension that varies along at least part of the axis,
• said edge wall being configured to direct the flow of the composition to the substrate edge,
• said edge wall including—
• a curved sidewall, with the opening having a cross-sectional sidewall dimension along the curved sidewall,
• said sidewall dimension varying axially, with at least one axial position presenting a sidewall dimension that is configured to be greater than the substrate dimension, and
• a lip coupled with said curved sidewall to be positioned below and adjacent to the sidewall,
• said lip projecting radially inwardly to define an innermost end, with the opening having a cross-sectional lip dimension at the innermost end that is configured to be less than the substrate dimension, such that the lip is dimensioned to underlie the substrate edge yet define the opening to be otherwise coextensive with the substrate, wherein the baffle is open below the substrate except for the lip when the substrate is placed within the baffle,
• said baffle comprising less than about 5% by weight metal, based upon the total weight of the baffle taken as 100% by weight.

In a baffle for affecting the flow of a composition during application of the composition to a substrate having a maximum cross-sectional substrate dimension and an edge, the improvement comprising:

• an annular open-bottom base with upper and lower surfaces,
• said base including a continuous interior edge wall that intersects the upper and lower surfaces to define a base opening extending continuously between and through the upper surface and the lower surface so that the baffle is open at the lower surface,
• said base opening presenting an upright opening axis, with the opening having a cross-sectional dimension that varies along at least part of the axis,
• said edge wall being configured to direct the flow of the composition to the substrate edge,
• said edge wall including—
• a vertical surface;
• a curved sidewall having an apex, said apex being recessed a distance “l” defined as the distance from the apex to a line taken along the same plane as the vertical surface,
• said opening having a cross-sectional sidewall dimension along the curved sidewall,
• said sidewall dimension varying axially, with at least one axial position presenting a sidewall dimension that is configured to be greater than the substrate dimension;
• and
• a lip coupled with said curved sidewall to be positioned below and adjacent to the sidewall,
• said lip extending away from the apex and presenting an innermost end, said lip having a length “L” defined as the distance from the line taken along the vertical surface plane to said innermost end, wherein the length “L” is from about 1.5-4 times greater than the length “l,”
• said opening having a cross-sectional lip dimension at the innermost end that is configured to be less than the substrate dimension, such that the lip is dimensioned to underlie the substrate edge yet define the opening to be otherwise coextensive with the substrate, wherein the baffle is open below the substrate except for the lip when the substrate is placed within the baffle.

The combination of:

• a substrate having a maximum cross-sectional dimension and an edge;
• and
• an open-bottom baffle for affecting the flow of a composition during application of the composition to the substrate,
• said baffle comprising an annular base with upper and lower surfaces,
• said base including a continuous interior edge wall that intersects the upper and lower surfaces to define a base opening extending continuously between and through the upper surface and the lower surface so that the baffle is open at the lower surface,
• said base opening presenting an upright opening axis, with the opening having a cross-sectional dimension that varies along at least part of the axis,
• said edge wall being configured to direct the flow of the composition to the substrate edge,
• said edge wall including—
• a curved sidewall, with the opening having a cross-sectional sidewall dimension along the curved sidewall,
• said sidewall dimension varying axially,
• said substrate being positioned within the opening adjacent the curved sidewall but not in contact with the baffle, and
• a lip coupled with the curved sidewall to be positioned below and adjacent to the sidewall,
• said lip projecting radially inwardly to define an innermost end, with the opening having a cross-sectional lip dimension at the innermost end that is less than the substrate dimension, such that the lip is dimensioned to underlie the substrate edge yet define the opening to be otherwise coextensive with the substrate, wherein the baffle is open below the substrate except for the lip.