Methods for producing organic nanocrystals
AssigneeIllinois Institute of Technology
InventorsAllan S. Myerson, In Sung Lee
Life of this patent
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Abstract
Methods for producing small crystals on islands formed on specialized substrates by, inter alia, subjecting the substrate to a hydrophilic SAMs solution for self-assembling hydrophilic SAMs on certain portions of the substrate surface and subjecting the substrate to a hydrophobic SAMs solution for self-assembling hydrophobic SAMs on certain other portions of the substrate surface.
Claims8
A method for growing small crystals having a crystal size of 2 microns or less on substrates comprising the steps of:
- (a) applying a photoresist film to a substrate;
- (b) placing a pattern mask having a desired pattern of islands over the photoresist film and subjecting the substrate to photolithography;
- (c) removing the pattern mask from the coated substrate;
- (d) selectively removing the photoresist film from at least a first portion of the substrate;
- (e) subjecting the substrate to a hydrophilic SAMs solution for self-assembling hydrophilic SAMs on certain portions of the substrate surface;
- (f) selectively removing the photoresist film from at least a second portion of the substrate;
- and
- (g) subjecting the substrate to a hydrophobic SAMs solution for self-assembling hydrophobic SAMs on certain other portions of the substrate surface,
- wherein:
- (i) the substrate is a hydrophilic flexible polymer;
- (ii) the substrate is coated with a hydrophobic photoresist film;
- (iii) the pattern mask is prepared having a desired pattern of islands, the pattern mask is placed on the coated substrate, and the coated substrate is subjected to the photolithography at an appropriate wavelength of light;
- and
- (iv) the photoresist film is removed from the areas of the substrate not exposed to the light such that the hydrophilic substrate surface (the pattern of islands) is exposed through the hydrophobic photoresist film.
A method for growing small crystals having a crystal size of 2 microns or less on substrates comprising the steps of:
- (a) applying a photoresist film to a substrate;
- (b) placing a pattern mask having a desired pattern of islands over the photoresist film and subjecting the substrate to photolithography;
- (c) removing the pattern mask from the coated substrate;
- (d) selectively removing the photoresist film from at least a first portion of the substrate;
- (e) subjecting the substrate to a hydrophilic SAMs solution for self-assembling hydrophilic SAMs on certain portions of the substrate surface;
- (f) selectively removing the photoresist film from at least a second portion of the substrate;
- and
- (g) subjecting the substrate to a hydrophobic SAMs solution for self-assembling hydrophobic SAMs on certain other portions of the substrate surface,
- wherein:
- (i) the substrate is a hydrophilic flexible polymer substrate;
- (ii) the substrate is coated with the photoresist film;
- (iii) the pattern mask is prepared having a desired pattern of islands, the pattern mask is placed on the coated substrate, and the coated substrate is subjected to the photolithography at an appropriate wavelength of light;
- (iv) the pattern mask is removed and hydrophobic material is coated on top of the photoresist film;
- and
- (v) the photoresist film is removed from the areas of the substrate not exposed to the light such that the hydrophilic substrate surface (the pattern of islands) is exposed through the hydrophobic photoresist film.
Dependencies are inferred from the claim text.