Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks
AssigneeMicron Technology, Inc.
InventorMing-Chuan Yang
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Abstract
Microlithography masks are disclosed, such as those that include one or more image reversal assist features disposed between at least two primary mask features. The one or more image reversal assist features may be defined by a patterned relatively non-transparent material on a mask substrate. Microlithography systems include such masks. Methods of forming microlithography masks are also disclosed, such as those that include patterning a relatively non-transparent material on a mask substrate to form at least one image reversal assist feature located between at least two primary features.
Claims27
A microlithography mask, comprising:
- a substantially transparent material;
- and
- a patterned, relatively non-transparent material over the substantially transparent material, the relatively non-transparent material defining a plurality of features of the microlithography mask, the plurality of features comprising:
- at least two primary features;
- and
- at least one image reversal assist feature between the at least two primary features.
A microlithography system, comprising:
- an illumination system configured to emit electromagnetic radiation;
- a mask comprising at least one image reversal assist feature between at least two primary features, the mask configured to selectively transmit electromagnetic radiation emitted by the illumination system;
- and
- a projection lens assembly configured to project electromagnetic radiation emitted by the illumination system and transmitted by the mask onto a workpiece.
A method of forming a microlithography mask, comprising patterning a relatively non-transparent material on a substantially transparent material, wherein the patterning comprises forming at least one image reversal assist feature disposed between at least two primary features.
Dependencies are inferred from the claim text.