Mask plate and manufacturing method thereof
AssigneeBeijing Boe Optoelectronics Technology Co., Ltd.
InventorsYunfeng Piao, Chunbae Park, Wei Qin, Wei Wang
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Abstract
The present invention discloses a mask plate and manufacturing method thereof. The mask plate comprises a substrate formed with a transparent region, a non-transparent region and a semi-transparent region. The semi-transparent region comprises a semi-transparent film, and a middle portion of the semi-transparent region is formed so that the intensity of the light transmitted therethrough is reduced in a larger extent than that in which the intensity of the light transmitted through the portion other than the middle portion in the semi-transparent region is reduced, whereby the light transmitted through the semi-transparent region is uniform.
Claims24
A half-tone mask plate comprising:
- a substrate formed with a transparent region, a non-transparent region and a semi-transparent region, which regions correspond to three pattern regions with different exposure extents in a photolithograph process, the exposure extent of the semi-transparent region being between that of the transparent region and that of the non-transparent region, wherein the semi-transparent region comprises a semi-transparent film, and a middle portion of the semi-transparent region is formed so that the intensity of the light transmitted therethrough is reduced in a larger extent than that in which the intensity of the light transmitted through the portion other than the middle portion in the semi-transparent region is reduced, whereby the light transmitted through the semi-transparent region is uniform.
A method for manufacturing a half-tone mask plate comprising:
- forming a transparent region, a non-transparent region, and a semi-transparent region on a substrate, which regions corresponds to three pattern region with different exposure extents in an photolithograph process, the exposure extent of the semi-transparent region being between that of the transparent region and that of the non-transparent region, wherein the non-transparent region is formed by pattering a metal layer formed on the substrate;
- and the semi-transparent region is formed by patterning a semi-transparent film formed on the substrate, and a middle portion of the semi-transparent region is formed so that the intensity of the light transmitted therethrough is reduced in a larger extent than that in which the intensity of the light transmitted through the portion other than the middle portion in the semi-transparent region is reduced, whereby the light transmitted through the semi-transparent region is uniform.
Dependencies are inferred from the claim text.