Gas-inputting device for vacuum sputtering apparatus
AssigneeHon Hai Precision Industry Co., Ltd.
InventorsChung-Pei Wang, Chia-Ying Wu
Life of this patent
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Abstract
A gas-inputting device for a vacuum sputtering apparatus includes at least one tapered tube. Each tapered tube includes a open end, a closed end, and a conical surface. The small end is configured for introducing gas into the tapered tube. The large end opposes to the open end. Each of the at least one tapered tube tapers from the closed end to the open end. The conical surface connects the open end to the closed end. A plurality of gas holes of a same size are defined in the conical surface and equidistantly arranged along the center axis of the tapered tube from the open end to the closed end.
Claims12
A gas-inputting device for a vacuum sputtering apparatus comprising a gas source and at least one tapered tube, each of the at least one tapered tube comprising:
- an open end connected to the gas source and configured for introducing gas into the tapered tube;
- a closed end opposing to the open end, each of the at least one tapered tube tapering from the closed end to the open end;
- a conical surface connecting the open end to the closed end, a plurality of gas holes of a same size defined in the conical surface and equidistantly arranged along the center axis of the tapered tube from the open end to the closed end.
Dependencies are inferred from the claim text.