Gas inlet element for a CVD reactor
AssigneeAixtron SE
InventorsMarkus Reinhold, Peter Baumann, Gerhard Karl Strauch
Life of this patent
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Abstract
The invention relates to a gas inlet element (2) for a CVD reactor with a chamber (4), which has a multitude of bottom-side outlet openings (23), via which a process gas introduced into the chamber (4) via edge-side access openings (10) exits into a process chamber (21) of the CVD reactor (1). In order to homogenize the gas composition, the invention provides that at least one mixing chamber arrangement (11, 12, 13) is situated upstream from the access openings (10), and at least two process gases are mixed with one another inside this mixing chamber arrangement.
Claims14
A gas inlet element (2) for a CVD reactor, said gas inlet element having a chamber (4), which chamber has a multiplicity of outlet openings (23) at a bottom thereof, through which outlet openings a process gas introduced into the chamber (4) via access openings (10) at a periphery of the chamber exits into a process chamber (21) of the CVD reactor (1), characterized in that the access openings (10) are preceded in a gas flow direction by a multiplicity of mixing chamber arrangements (11, 12, 13), disposed in substantially uniform circumferential distribution about the chamber (4), and in each of which at least two process gases are mixed with one another.
Dependencies are inferred from the claim text.