Semiconductor device production control method
AssigneeKabushiki Kaisha Toshiba
InventorSuigen Kyoh
Life of this patent
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Abstract
A semiconductor device production control method includes monitoring, after a production process of a semiconductor device, a process result at a predetermined position of a pattern to which the process is applied, to obtain a deviation with respect to a predetermined target result, quantitatively obtaining a degree of influence on an operation of a semiconductor device from the deviation of the process result, and comparing the degree of influence that is quantitatively obtained with a predetermined allowable margin for operation specifications of the semiconductor device.
Claims20
A method for controlling processes for producing a semiconductor device, the method comprising:
- measuring, after a first process is performed, a process result at a predetermined position of a pattern to which the first process is applied;
- calculating a deviation of the process result from a predetermined target result that is desired to be obtained by performing the first process;
- quantitatively obtaining, based on the deviation, a degree of influence on an operation specification of the semiconductor device;
- and
- comparing the degree of influence with a predetermined allowable margin for the operation specification.
A method for controlling processes for producing a semiconductor device, the method comprising:
- measuring monitoring, after a first process is performed, a process result at a predetermined position of a pattern to which the first process is applied;
- calculating a deviation of the process result from a predetermined target result that is desired to be obtained by performing the first process;
- obtaining a process tolerance based on a predetermined allowable margin of an operation specification of the semiconductor device and a degree of influence with respect to the deviation of the process result on the operation specification;
- and
- comparing the obtained process tolerance with the obtained deviation of the process result.
A program for controlling processes for producing a semiconductor device, the program being stored in a non-transitory computer-readable medium and, when executed, controlling a computer to perform following steps:
- measuring, after a first process is performed, a process result at a predetermined position of a pattern to which the first process is applied;
- calculating a deviation of the process result from a predetermined target result that is desired to be obtained by performing the first process;
- quantitatively obtaining, from the deviation, a degree of influence on an operation specification of the semiconductor device;
- and
- comparing the degree of influence with a predetermined allowable margin for the operation specification.
Dependencies are inferred from the claim text.