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US 8,283,792 B1Granted
Methods and systems for forming an alignment mark with optically mismatched alignment mark stack materials
AssigneeHitachi Global Storage Technologies Netherlands B.V.
InventorYi Zheng
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Abstract
Methods for fabricating an alignment mark are disclosed. A method includes forming a base layer that includes a first material and forming an alignment mark layer above the base layer that includes a second material that is optically mismatched with the first material. The alignment mark is formed using both first and second layers.
Claims2
An alignment mark, comprising:
- a base layer comprising a first material;
- an alignment mark layer above said base layer and comprising a second material that is optically mismatched with said first material;
- and
- a variable thickness optically transparent Al2O3 spacer between said first material and said second material.
1 more element
Dependencies are inferred from the claim text.