Methods of forming microdevice substrates using double-sided alignment techniques
AssigneeIntegrated Device Technology, Inc.
InventorsWanling Pan, Harmeet Bhugra
Life of this patent
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Abstract
Methods of forming substrates having two-sided microstructures therein include selectively etching a first surface of the substrate to define a plurality of alignment keys therein that extend through the substrate to a second surface thereof. A direct photolithographic alignment step is then performed on a second surface of the substrate by aligning a photolithography mask to the plurality of alignment keys at the second surface. This direct alignment step is performed during steps to photolithographically define patterns in the second surface.
Claims8
A method of forming a substrate having two-sided microstructures therein, comprising:
- selectively etching a first surface of the substrate to define a plurality of alignment keys therein that extend through the substrate to a second surface thereof;
- bonding a semiconductor capping layer to the selectively etched first surface of the substrate, said semiconductor capping layer having a recess therein extending opposite the first surface;
- and then
- forming a photolithographically defined pattern in the second surface by aligning a photolithography mask to the plurality of alignment keys at the second surface.
A method of forming a microdevice substrate, comprising:
- selectively etching a first surface of a semiconductor device layer to define at least one alignment key therein that extends entirely through the semiconductor device layer to a second surface thereof;
- bonding a semiconductor capping layer to the selectively etched first surface of the semiconductor device layer, said semiconductor capping layer having a recess therein extending opposite the first surface;
- and then
- forming a photolithographically defined pattern in the second surface of the semiconductor device layer by aligning a photolithography mask to the at least one alignment key on the second surface.
Dependencies are inferred from the claim text.