Plasma processing method and plasma processing apparatus
AssigneeHitachi High-Technologies Corporation
InventorsYutaka Ohmoto, Mamoru Yakushiji, Yutaka Kouzuma, Ken Yoshioka, Tsunehiko Tsubone
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AssigneeHitachi High-Technologies Corporation
InventorsYutaka Ohmoto, Mamoru Yakushiji, Yutaka Kouzuma, Ken Yoshioka, Tsunehiko Tsubone
Estimating the term…
A plasma processing apparatus includes: a film which is made of an insulative material and constructs a surface of a sample stage on which a sample is put; a disk-shaped member whose upper surface is joined with the film in a lower portion of the film and which is made of a heat conductive member; heaters which are arranged in the film and arranged in a center portion and regions of its outer peripheral side of the film; coolant channels which are arranged in the disk-shaped member and in which a coolant for cooling the disk-shaped member flows; a plurality of power sources each of which adjusts an electric power to each of the heaters in the plurality of regions; and a controller which adjusts outputs from the plurality of power sources by using a result obtained by presuming a temperature of the upper surface of the disk-shaped member.
A plasma processing method for processing a sample located on a sample stage disposed inside a processing room arranged in a vacuum chamber using a plasma,
Dependencies are inferred from the claim text.