Substrate table, lithographic apparatus and device manufacturing method

A table for an immersion lithographic apparatus, the table comprising:

• a capillary passage forming surface configured to form a first side of a capillary passage when an object is on the table, a surface of the object forming a second side, opposite to the first side, of the capillary passage;
• and
• a channel configured such that an overpressure of gas in the channel is effective to apply a radially outward force on a liquid in the capillary passage, when the liquid is in the capillary passage, with a net flow of the gas radially inwardly of the liquid in the capillary passage.

A table for an immersion lithographic apparatus, the table comprising:

• a capillary passage forming surface configured to form a first side of a capillary passage when an object is in a recess in a top surface of the table, a surface of the object forming a second side, opposite the first side, of the capillary passage;
• and
• an opening in a surface of the table, the opening in or adjacent to the capillary passage forming surface and configured to supply liquid to the capillary passage, the opening being intermediate the ends of the capillary passage.