Composite focused ion beam device, process observation method using the same, and processing method

A processing and observation method of a sample, the method comprising the steps of:

• processing a sample by irradiating the sample with a first ion beam from a first ion beam irradiation system having a plasma type gas ion source that generates first ions for forming the first ion beam, the first ions each having a first mass;
• and
• observing the sample by irradiating the sample with a second ion beam from a second ion beam irradiation system having a gas field ion source that generates second ions for forming the second ion beam, the second ions each having a second mass smaller than the first mass.

A processing method of a sample, the method comprising the steps of:

• performing rough processing of a sample by irradiating the sample with a first ion beam from a first ion beam irradiation system having a plasma type gas ion source that generates first ions for forming the first ion beam, the first ions each having a first mass;
• and
• performing finishing processing of the sample by irradiating the sample with a second ion beam from a second ion beam irradiation system having a gas field ion source that generates second ions for forming the second ion beam, the second ions each having a second mass smaller than that of the first mass.