Method for fabricating wiring structure of wiring board

A method for fabricating a wiring structure of a wiring board, comprising:

• providing a substrate comprising an insulation layer and a film disposed on the insulation layer, wherein the film has an outer surface
• forming an intaglio pattern partially exposing the insulation layer on the outer surface, wherein the intaglio pattern is formed by removing a portion of the insulation layer and a portion of the film;
• forming an activated layer on the outer surface and in the intaglio pattern, wherein the activated layer completely covers the outer surface and all surfaces of the intaglio pattern;
• removing the activated layer on the outer surface and the film, and remaining the activated layer in the intaglio pattern;
• and
• forming a conductive material in the intaglio pattern by using a chemical deposition method after removing the film and the activated layer on the outer surface, wherein the conductive material is formed through the chemical reactions occurred from the activated layer remained in the intaglio pattern.