Method of manufacturing optical element, and optical element
AssigneeHoya Corporation
InventorsKazuhide Yamashiro, Hideki Suda
Life of this patent
Estimating the term…
Abstract
A manufacturing method of an optical element is provided, the optical element comprising: a shield part formed by a light shielding film formed and patterned on a substrate; a light transmission part formed by partially exposing a surface of the substrate; and a phase shifter part formed by partially etching the surface of the substrate, the method comprising the steps of: preparing an optical element blank with the light shielding film and a first resist film laminated on the substrate in this order; and forming a first resist pattern by applying drawing and development to the first resist film, covering a formation scheduled area of the shield part, and demarcating the formation scheduled area of the phase shifter part.
Claims8
A manufacturing method of an optical element, said optical element comprising:
- a light shielding part formed by a light shielding film formed and patterned on a substrate;
- a light transmission part formed by partially exposing a surface of the substrate;
- and
- a phase shifter part formed by partially etching the surface of the substrate, said phase shifter part having a portion adjacent to the light transmission part,
- said method comprising the steps of:
- preparing an optical element blank having the light shielding film and a first resist film laminated on the substrate;
- forming a first resist pattern by applying drawing and development to the first resist film, said first resist pattern covering an area for the light shielding part and for, in the area for the light transmission part, forming a bordering pattern which borders an area for the phase shifter part,
- etching the light shielding film with the first resist pattern as a mask to form the light shielding part and the bordering pattern,
- forming a second resist pattern by applying drawing and development to a second resist film, said second resist pattern exposes the substrate in an area for the phase shifter part,
- etching the exposed substrate to form the phase shifter part with the second resist pattern and the bordering pattern as masks, and
- forming the light transmission part by removing the second resist pattern and the bordering pattern.
Dependencies are inferred from the claim text.