Method for film formation, apparatus for film formation, and computer-readable recording medium
AssigneeTokyo Electron Limited
InventorsMasamichi Hara, Yasushi Mizusawa, Satoshi Taga, Atsushi Gomi, Tatsuo Hatano
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Abstract
Disclosed is a method for film formation, characterized by comprising allowing a treatment gas stream containing a metal carbonyl-containing treatment gas and a carbon monoxide-containing carrier gas to flow into a region on the upper outside of the outer periphery of a substrate to be treated in a diameter direction of the substrate while avoiding the surface of the substrate and diffusing the metal carbonyl from the treatment gas stream into the surface of the substrate to form a metal film on the surface of the substrate.
Claims5
A method for forming a metal film on the surface of a substrate to be processed comprising:
- providing a process gas supply unit including a process gas introducing unit and a process gas blocking unit in an upper side of a substrate holding plate provided in a processing chamber to hold the substrate, where, when viewed from a vertical direction, the process gas introducing unit is positioned at an upper-outer side of the substrate than the periphery of the substrate and the process gas blocking unit is positioned at an upper side of the substrate;
- supplying the process as including a raw gas containing a metal carbonyl and a carrier gas containing carbon monoxide into the processing chamber through the process gas introducing unit, thereby supplying the process gas substantially to the region of an upper-outer side of the substrate than the periphery of the substrate;
- and
- diffusing the metal carbonyl to the surface of the substrate from the flow of the process gas thereby depositing the metal film on the surface of the substrate.
Dependencies are inferred from the claim text.