Fracturing continuous photolithography masks
AssigneeInternational Business Machines Corporation
InventorsYing Liu, David Osmond Melville, Alan E Rosenbluth, Kehan Tian
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AssigneeInternational Business Machines Corporation
InventorsYing Liu, David Osmond Melville, Alan E Rosenbluth, Kehan Tian
Estimating the term…
A method, system, and computer usable program product for fracturing a continuous mask usable in photolithography are provided in the illustrative embodiments. A first origin point is selected from a set of points on an edge in the continuous mask. A first end point is identified on the edge such that a separation metric between the first origin point and the first end point is at least equal to a threshold value. Several alternatives are determined for fracturing using the first origin point and the first end point. A cost associated with each of the several alternatives is computed and one of the alternatives is selected as a preferred fracturing. Several pairs of origin points and end points are formed from the set of points. Each pair has a cost of a preferred fracturing between the pair. The continuous mask is fractured using a subset of the several pairs.
A computer implemented method for fracturing a continuous mask, comprising:
A computer usable program product comprising a computer usable non-transitory storage medium including computer usable code for fracturing a continuous mask, the computer usable code comprising:
A data processing system for fracturing a continuous mask, the data processing system comprising:
Dependencies are inferred from the claim text.