Lithographic apparatus and device manufacturing method for clamping a patterning device

A lithographic apparatus comprising:

• an illumination system configured to condition a radiation beam;
• a patterning device support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a stationary frame comprising a vacuum pump and a first vacuum buffer;
• a cable support or cable shuttle, that is a movable part, configured to carry cables between said patterning device support and the stationary frame of the lithographic apparatus, wherein the cable support or cable shuttle is distinct and separate from the patterning device support and the stationary frame of the lithographic apparatus;
• a second vacuum buffer located on the cable support or cable shuttle configured to be closer to the patterning device support than the stationary frame so as to reduce the time needed to obtain a low pressure level sufficient to close a vacuum valve and to thereby reduce the time required for exchanging patterning devices;
• a substrate table constructed to hold a substrate;
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
• and
• two or more types of clamping devices, that are configured to exert a clamping force on substantially overlapping areas of at least a side of said patterning device that faces the illumination system.

A device manufacturing method comprising:

• holding a patterning device with a patterning device support;
• patterning a beam of radiation with the patterning device to form a patterned beam of radiation;
• and
• projecting the patterned beam of radiation onto a substrate,
• wherein said holding includes clamping the patterning device at a top side thereof to an underside of the patterning device support, and
• wherein the above steps are accomplished by using a lithography apparatus comprising:
• a stationary frame comprising a vacuum pump and a first vacuum buffer;
• a cable support or cable shuttle, that is a movable part, configured to carry cables between said patterning device support and the stationary frame of the lithographic apparatus, wherein the cable support or cable shuttle is distinct and separate from the patterning device support and the stationary frame of the lithographic apparatus;
• a second vacuum buffer located on the cable support or cable shuttle configured to be closer to the patterning device support than the stationary frame so as to reduce the time needed to obtain a low pressure level sufficient to close a vacuum valve and to thereby reduce the time required for exchanging patterning devices.

A device manufacturing method comprising:

• patterning a beam of radiation with a patterning device to form a patterned beam of radiation;
• projecting the patterned beam of radiation onto a substrate;
• and
• during projection of the patterned beam, exerting a clamping force on substantially overlapping areas of a side of the patterning device that faces the beam of radiation with two or more types of clamping devices, and
• wherein the above steps are accomplished by using a lithography apparatus comprising:
• a stationary frame comprising a vacuum pump and a first vacuum buffer;
• a cable support or cable shuttle, that is a movable part, configured to carry cables between said patterning device support and the stationary frame of the lithographic apparatus, wherein the cable support or cable shuttle is distinct and separate from the patterning device support and the stationary frame of the lithographic apparatus;
• a second vacuum buffer located on the cable support or cable shuttle configured to be closer to the patterning device support than the stationary frame so as to reduce the time needed to obtain a low pressure level sufficient to close a vacuum valve and to thereby reduce the time required for exchanging patterning devices.