Composition and method for reducing pattern collapse
AssigneeTokyo Electron Limited
InventorMark H. Somervell
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Abstract
A radiation-sensitive composition and method for using the composition to reduce the probability of pattern collapse is provided. The radiation-sensitive composition includes a bulk matrix of radiation-sensitive material with a base-reactive, surface-modifying agent dispersed throughout the matrix. The base-reactive, surface-modifying agent is reactive to hydroxide and increases the surface hydrophobicity of a pattern formed in a layer of the radiation-sensitive composition upon treatment with a basic developing solution during lithographic processing of a substrate.
Claims19
A radiation-sensitive composition for use in lithographic processing comprising a bulk radiation-sensitive material matrix and a base-reactive, surface-modifying agent dispersed in the matrix that increases in hydrophobicity upon reaction with a basic developing solution, wherein the base-reactive, surface modifying agent comprises a poly-fluorinated C6 to C25 carbon chain portion having a ratio of fluorine atoms to carbon atoms sufficient to increase the hydrophobicity of the agent after reaction with the basic developing solution.
The composition of claim of 1, wherein the base-reactive, surface-modifying agent comprises one or more base-reactive functional groups selected from the group consisting of ester, amide, β-alkoxy carbonyl, and β-alkoxy nitrile.
A method for patterning a layer of radiation-sensitive composition with reduced probability of pattern collapse, comprising:
- coating a radiation-sensitive composition on a substrate to form a layer, wherein the radiation-sensitive composition comprises a bulk radiation-sensitive material matrix and a base-reactive, surface-modifying agent dispersed in the matrix that increases in hydrophobicity upon reaction with a basic developing solution, wherein the base-reactive, surface modifying agent comprises a poly-fluorinated C6 to C25 carbon chain portion having a ratio of fluorine atoms to carbon atoms sufficient to increase the hydrophobicity of the agent after reaction with the basic developing solution;
- exposing the layer of radiation-sensitive composition to a pattern of radiation to define an image pattern therein;
- and
- contacting the layer of radiation-sensitive composition with the basic developing solution to develop the image pattern and form a development pattern in the layer of radiation-sensitive composition, wherein the development pattern has a surface portion comprising the base-reactive, surface-modifying agent that has reacted with the basic developing solution thereby increasing the hydrophobicity of the surface portion.
Dependencies are inferred from the claim text.