Plasma processing apparatus, plasma processing method and storage medium

A plasma processing apparatus comprising:

• a processing vessel accommodating a target object;
• a microwave generator configured to generate a microwave;
• a waveguide configured to induce the microwave generated by the microwave generator to the processing vessel;
• a planar antenna made of a conductive material and having a plurality of microwave radiation holes through which the microwave induced to the waveguide is radiated toward the processing vessel;
• a microwave transmission plate made of a dielectric material and configured to serve as a ceiling wall of the processing vessel and transmit the microwave passed from the microwave radiation holes of the planar antenna;
• a processing gas inlet unit configured to introduce a processing gas into the processing vessel;
• a magnetic field generating unit positioned above the planar antenna and configured to generate a magnetic field within the processing vessel and control a property of plasma of the processing gas by the magnetic field, the plasma being generated by the microwave within the processing vessel, the magnetic field generating unit comprising at least two ring-shaped magnets arranged concentrically with the planar antenna;
• and
• a magnet moving unit configured to move at least one of the ring-shaped magnets.