Dynamic fluid control system for immersion lithography
AssigneeNikon Corporation
InventorMichael Sogard
Life of this patent
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Abstract
An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.
Claims29
An apparatus comprising:
- a stage that supports a substrate;
- an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid;
- and
- a pressure control system that controls pressure of the immersion liquid in the gap, the pressure control system including an actuator that is positioned to contact the immersion liquid in the gap to control the pressure of the immersion liquid in the gap.
A method of controlling an immersion lithography apparatus in which an optical system having a last optical element projects an image onto a substrate held by a stage and spaced from the last optical element, the image being projected through an immersion liquid disposed in at least a part of a gap between the last optical element and the substrate, the method comprising:
- controlling a pressure of the immersion liquid in the gap using an actuator that contacts the immersion liquid in the gap.
Dependencies are inferred from the claim text.