Back to results
US 8,148,054 B2Granted
Immersion multiple-exposure method and immersion exposure system for separately performing multiple exposure of micropatterns and non-micropatterns
AssigneeKabushiki Kaisha Toshiba
InventorTakehiro Kondoh
Life of this patent
Estimating the term…
Abstract
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a cleaning step of clearing the surface of the substrate, and a second exposure step of performing immersion exposure of the photoresist film using a second mask. No heating process is performed between the first exposure step and the second exposure step.
Claims10
An immersion multiple-exposure method comprising:
- forming a photoresist film on a substrate;
- performing first immersion exposure of the photoresist film using a first mask;
- cleaning a surface of the substrate with the photoresist film at least once;
- and
- performing second immersion exposure of the photoresist film after cleaning the surface of the substrate with the photoresist film, using a second mask.
2 more elements
Dependencies are inferred from the claim text.