Plasma display panel including frameless EMI filter, and/or method of making the same

A plasma display device comprising:

• a plasma display panel (PDP);
• and
• an electromagnetic interference (EMI) filter including an EMI coating supported by a glass substrate, the EMI coating including the following layers moving away from the glass substrate:
• an anti-reflective coating;
• a first dielectric layer;
• a first EMI shielding layer comprising silver;
• a second dielectric layer;
• a second EMI shielding layer comprising silver
• a third dielectric layer;
• a third EMI shielding layer comprising silver
• a fourth dielectric layer;
• a fourth EMI shielding layer comprising silver;
• and
• an overcoat layer comprising a transparent conducting oxide (TCO),
• wherein the glass substrate and the EMI coating combined have a visible transmission of at least about 60%,
• wherein the EMI filter has a sheet resistance of less than about 0.9,
• wherein the TCO has a refractive index of about 1.95-2.05
• wherein the overcoat layer comprising the TCO is in electrical contact with an overlapping metal frame of the plasma display panel.

An EMI filter for a plasma display device comprising:

• an EMI coating supported by a glass substrate, the EMI coating including the following layers moving away from the glass substrate:
• a first high refractive index layer;
• a first layer comprising silicon nitride;
• a first layer comprising zinc oxide;
• a first EMI shielding layer comprising silver contacting the first layer comprising zinc oxide;
• a first layer comprising an oxide of Ni and/or Cr contacting the first EMI shielding layer comprising silver;
• a first layer comprising metal oxide;
• a second layer comprising silicon nitride;
• a second layer comprising zinc oxide;
• a second EMI shielding layer comprising silver contacting the second layer comprising zinc oxide;
• a second layer comprising an oxide of Ni and/or Cr contacting the second EMI shielding layer comprising silver;
• a second layer comprising metal oxide;
• a third layer comprising silicon nitride;
• a third layer comprising zinc oxide;
• a third EMI shielding layer comprising silver contacting the third layer comprising zinc oxide;
• a third layer comprising an oxide of Ni and/or Cr contacting the third EMI shielding layer comprising silver;
• a third layer comprising metal oxide;
• a fourth layer comprising silicon nitride;
• a fourth layer comprising zinc oxide;
• a fourth EMI shielding layer comprising silver contacting the fourth layer comprising zinc oxide;
• a fourth layer comprising an oxide of Ni and/or Cr contacting the fourth EMI shielding layer comprising silver;
• and
• an overcoat layer comprising a transparent conducting oxide (TCO),
• wherein the EMI filter has a sheet resistance of less than about 1,
• wherein the overcoat layer comprising the TCO is about 30-40 nm thick, and
• wherein the TCO has a refractive index of about 1.95-2.05
• wherein the overcoat layer comprising the TCO is adapted to be in electrical contact with an overlapping metal frame of the plasma display device, and wherein the fourth EMI shielding layer comprising silver is thicker than at least two of the first, second and third EMI shielding layers comprising silver.