Simultaneous photolithographic mask and target optimization
AssigneeInternational Business Machines Corporation
InventorsKanak B. Agarwal, Shayak Banerjee, Damir A. Jamsek
Life of this patent
Estimating the term…
Abstract
A mechanism is provided for simultaneous photolithographic mask and target optimization (SMATO). A lithographic simulator generates an image of a mask shape on a wafer thereby forming one or more lithographic contours. A mask and target movement module analytically evaluates a direction for mask and target movement thereby forming a plurality of pairs of mask and target movements. The mask and target movement module identifies a best pair of mask and target movements from the plurality of mask and target movements that minimizes a weighted cost function. A shape adjustment module adjusts at least one of a target shape or the mask shape based on the best pair of mask and target movements.
Claims20
A method, in a data processing system, for simultaneous photolithographic mask and target optimization (SMATO), the method comprising:
- generating, by a lithographic simulator, an image of a mask shape on a wafer thereby forming one or more lithographic contours;
- analytically evaluating, by a mask and target movement module, a direction for mask and target movement thereby forming a plurality of pairs of mask and target movements;
- identifying, by the mask and target movement module, a best pair of mask and target movements from the plurality of mask and target movements that minimizes a weighted cost function;
- and
- adjusting, by a shape adjustment module, at least one of a target shape or the mask shape based on the best pair of mask and target movements.
A computer program product comprising a computer readable storage medium having a computer readable program stored therein, wherein the computer readable program, when executed on a computing device, causes the computing device to:
- generate an image of a mask shape on a wafer thereby forming one or more lithographic contours;
- analytically evaluate a direction for mask and target movement thereby forming a plurality of pairs of mask and target movements;
- identify a best pair of mask and target movements from the plurality of mask and target movements that minimizes a weighted cost function;
- and
- adjust at least one of a target shape or the mask shape based on the best pair of mask and target movements.
An apparatus, comprising:
- a processor;
- and
- a memory coupled to the processor, wherein the memory comprises instructions which, when executed by the processor, cause the processor to:
- generate an image of a mask shape on a wafer thereby forming one or more lithographic contours;
- analytically evaluate a direction for mask and target movement thereby forming a plurality of pairs of mask and target movements;
- identify a best pair of mask and target movements from the plurality of mask and target movements that minimizes a weighted cost function;
- and
- adjust at least one of a target shape or the mask shape based on the best pair of mask and target movements.
Dependencies are inferred from the claim text.