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US 8,139,218 B2Granted
Substrate distortion measurement
AssigneeASML Netherlands B.V.
InventorErik Marie Jose Smeets
Life of this patent
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Abstract
A substrate distortion measurement apparatus comprising one or more optical detectors arranged to measure the locations of pits or holes provided in a substrate, a memory arranged to store previously determined locations of the pits or holes in the substrate, and a comparator arranged to compare the measured locations of the pits or holes with the previously determined locations of the pits or holes, to determine distortion of the substrate.
Claims21
A method comprising:
- (i) measuring the sizes and locations of marks on a substrate;
- (ii) determining distortions in the substrate by comparing the measured sizes and locations with previously measured sizes and locations of the marks;
- and
- (iii) exposing the substrate to patterned radiation,
- wherein a first side of the substrate is exposed to the patterned radiation and wherein the sizes and locations of the marks are measured from a second side of the substrate that is opposite to said first side.
2 more elements
A substrate distortion measurement apparatus comprising:
- (i) a detector arranged to measure sizes and locations of marks provided on a substrate,
- (ii) a memory arranged to store previously measured sizes and locations of the marks that are located on the substrate, and
- (iii) a comparator arranged to compare the measured sizes and locations of the marks with the previously measured sizes and locations of the marks,
- wherein, in use, a first side of the substrate is exposed to a patterned radiation so as to form a pattern on said first side and wherein the sizes and locations of the marks are measured from a second side of the substrate that is opposite to said first side.
1 more element
A lithography apparatus comprising:
- a substrate distortion measurement apparatus comprising:
- (i) a detector arranged to measure sizes and locations of marks provided on a substrate,
- (ii) a memory arranged to store previously measured sizes and locations of the marks that are located on the substrate, and
- (iii) a comparator arranged to compare the measured sizes and locations of the marks with the previously measured sizes and locations of the marks, and
- an array of moveable mirrors arranged to form a pattern to be projected onto the substrate, and control electronics arranged to adjust the pattern formed by the moveable mirrors to compensate for the determined distortion of the substrate,
- wherein a first side of the substrate is exposed with the pattern and wherein the sizes and locations of the marks are measured from a second side of the substrate that is opposite to said first side.
3 more elements
Dependencies are inferred from the claim text.