Lithographic apparatus and device manufacturing method

An object for use in a lithographic apparatus, the lithographic apparatus arranged to project a radiation beam onto the object when held on a support table through an immersion liquid which is confined to a space by a barrier member, wherein the object comprises a membrane attachable or attached to a top surface of the object and/or support table and to bridge or keep to a minimum a gap between the object and the support table to minimize bubble formation during use in the lithographic apparatus.

A lithographic projection apparatus arranged to project a radiation beam onto an object held on a support table through an immersion liquid which is confined to a space by a barrier member, the object comprising at least one selected from the following:

• a sensor, a closing plate or any other non-substrate object in or on the support table, wherein the apparatus comprises a cover plate to cover the object and at least one other non-substrate component so as to cover a gap between the object and the support table and a gap between the at least one other component and the support table.