Plasma processing apparatus
AssigneeTes Co., Ltd
InventorSung Ryul Kim
Life of this patent
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Abstract
Provided is a plasma processing apparatus including a chamber, a lower electrode, an upper electrode, and a substrate sensor. The chamber is configured to provide a reaction space. The lower electrode is disposed at a lower region in the chamber to mount a substrate thereon. The upper electrode is disposed at an upper region in the chamber to be opposite to the lower electrode. The substrate sensor is provided on the chamber to sense the substrate. Herein, the upper electrode includes an electrode plate and an insulating plate attached on the bottom of the electrode plate, and at least one guide hole is formed in the upper electrode to guide light output from the substrate sensor toward the substrate.
Claims12
A plasma processing apparatus comprising:
- a chamber configured to provide a reaction space;
- a lower electrode, on which a substrate is to be seated, disposed at a lower region in the chamber;
- an upper electrode facing the lower electrode and disposed at an upper region in the chamber;
- and
- a substrate sensor provided in the upper region of the chamber to sense the substrate,
- wherein the upper electrode comprises an electrode plate and an insulating plate attached on the bottom of the electrode plate, and at least one guide hole is formed in the upper electrode to guide light output from the substrate sensor toward the substrate,
- wherein the substrate sensor and the guide hole are provided on a vertical line corresponding to the edge of the substrate.
Dependencies are inferred from the claim text.